The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Mar. 02, 2011
Son Nguyen Kim, Hemsbach, DE;
Wolfgang Jahnel, Bellheim, DE;
Son Nguyen Kim, Hemsbach, DE;
Wolfgang Jahnel, Bellheim, DE;
BASF SE, Ludwigshafen, DE;
Abstract
A process of free-radical copolymerization of a monomer composition comprising: a) 70 to 100% by weight of acrylic acid, b) 0 to 30% by weight of at least one hydrophilic nonionic compound, different from a), having a free-radically polymerizable, α,β-ethylenically unsaturated double bond, c) 0 to 1% by weight of at least one free-radically polymerizable crosslinking compound which comprises at least two α,β-ethylenically unsaturated double bonds per molecule, by the method of precipitation polymerization in the presence of an auxiliary composition H) comprising H1) at least one compound with a block structure which comprises at least one hydrophobic group and at least one hydrophilic group, and H2) at least one basic compound different from H1).