The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Nov. 24, 2009
Applicants:
David W. Neyer, Castro Valley, CA (US);
David J. Rakestraw, Livermore, CA (US);
Jason E. Rehm, Alameda, CA (US);
Inventors:
David W. Neyer, Castro Valley, CA (US);
David J. Rakestraw, Livermore, CA (US);
Jason E. Rehm, Alameda, CA (US);
Assignee:
DH Technologies Development Pte. Ltd., Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 15/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
A liquid sample is prepared at a preparation site and then processed, e.g. in an HPLC column. The sample is prepared and conveyed to the device at a flow rate which is substantially less than the flow rate through the device. The different flow rates are preferably provided by variable rate working fluid supplies which drive the sample from the preparation site and through the device.