The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Oct. 13, 2009
Applicant:
Naoharu Nakaiso, Toyama, JP;
Inventor:
Naoharu Nakaiso, Toyama, JP;
Assignee:
Hitachi Kokusai Electric Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/22 (2006.01); C23C 16/24 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed is a substrate processing apparatus which comprises reaction tubes () for processing multiple substrates (), a heater () for heating the substrates, and gas introducing nozzles () for supplying a gas into the reaction tubes. Each of the gas introducing nozzles () is structured so that at least the channel cross section of a portion facing the heater () is larger than those of the other portions.