The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 18, 2014

Filed:

Aug. 11, 2008
Applicants:

Tzony Siegal, Moshav Shoeva, IL;

Yinnon Elisha, Tel Mond, IL;

Inventors:

Tzony Siegal, Moshav Shoeva, IL;

Yinnon Elisha, Tel Mond, IL;

Assignee:

NLT Spine Ltd., Kfar Saba, IL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 17/70 (2006.01);
U.S. Cl.
CPC ...
Abstract

An implant for maintaining a given minimum inter-spinous-process spacing includes an implant body with a number of segments hingedly interconnected so as to assume a straightened state for delivery along a conduit and a curved deployed state. An elongated tightening element is anchored at the distal segment of the implant body and passes along a channel extending along the implant body. Tension applied to the tightening element biases the implant body from the straightened state to the curved deployed state. Preferably, when the tightening element is deflected to reach the curved deployed state, a locking arrangement locks the tightening element relative to the implant body, thereby retaining the implant in the curved deployed state. A distal portion of the implant body is preferably formed with a set of lateral projections to inhibit withdrawal of the distal portion between adjacent spinous processes after deployment.


Find Patent Forward Citations

Siegal, Tzony. (2014). Device and method for spinous process distraction (U.S. Patent No. 8672977). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8672977

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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