The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2014
Filed:
Sep. 23, 2010
Demin Wang, Ottawa, CA;
Andre Vincent, Gatineau, CA;
Philip Blanchfield, Kanata, CA;
Robert Klepko, Kanata, CA;
Demin Wang, Ottawa, CA;
Andre Vincent, Gatineau, CA;
Philip Blanchfield, Kanata, CA;
Robert Klepko, Kanata, CA;
Abstract
Methods of image interpolation disclosed herein include a method of irregular-grid expanded-block weighted motion compensation (IEWMC) and a method of block-wise directional hole interpolation (BDHI). The IEWMC can be used with unidirectional motion or disparity trajectories. The IEWMC can be applied in both forward and backward directions, and the interpolated images resulting from IEWMC application can be superimposed, or averaged, to reduce the blocking artifacts and handle the holes and overlaps. The BDHI takes into account the orientation of local edges and textures when filling the holes, which results in a sharper interpolated image.