The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 2014

Filed:

May. 20, 2011
Applicants:

Bernard Viala, Sassenage, FR;

Marie-claire Cyrille, Sinard, FR;

Bernard Dieny, Lans en Vercors, FR;

Kévin Garello, Locmaria-Plouzane, FR;

Olivier Redon, Seyssinet Pariset, FR;

Inventors:

Bernard Viala, Sassenage, FR;

Marie-Claire Cyrille, Sinard, FR;

Bernard Dieny, Lans en Vercors, FR;

Kévin Garello, Locmaria-Plouzane, FR;

Olivier Redon, Seyssinet Pariset, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

According to this method for producing a magnetic tunnel junction, a film of a dielectric material capable of acting as a tunnel barrier is deposited between two nanocrystalline or amorphous magnetic films. The dielectric material constituting the tunnel barrier consists of an at least partially crystalline perovskite, and said material is deposited by ion beam sputtering in a vacuum chamber.


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