The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2014
Filed:
Jan. 17, 2013
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Pui Fun Lau, Vail, AZ (US);
David Montgomery, Costa Mesa, CA (US);
Karl A. Nielsen, Tucson, AZ (US);
Richard B. Stelmach, Tucson, AZ (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 12/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Provided are techniques for migrating a first extent, determining a spatial distance between the first extent and a second extent, determining a ratio of a profiling score of the second extent to the spatial distance, and, in response to determining that the ratio exceeds a threshold, migrating the second extent.
Lau, Pui. (2014). Spatial extent migration for tiered storage architecture (U.S. Patent No. 8667245). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8667245
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile