The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 04, 2014

Filed:

Feb. 06, 2013
Applicant:

Lockheed Martin Corporation, Bethesda, MD (US);

Inventors:

Weizhong Yan, Clifton Park, NY (US);

Frederick W. Wheeler, Niskayuna, NY (US);

Peter H. Tu, Niskayuna, NY (US);

Xiaoming Liu, Schenectady, NY (US);

Assignee:

Lockheed Martin Corporation, Bethesda, MD (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G07C 9/00 (2006.01);
U.S. Cl.
CPC ...
G07C 9/00158 (2013.01);
Abstract

A biometric sample training device, a biometric sample quality assessment device, a biometric fusion recognition device, an integrated biometric fusion recognition system and example processes in which each may be used are described. Wavelets and a boosted classifier are used to assess the quality of biometric samples, such as facial images. The described biometric sample quality assessment approach provides accurate and reliable quality assessment values that are robust to various degradation factors, e.g., such as pose, illumination, and lighting in facial image biometric samples. The quality assessment values allow biometric samples of different sample types to be combined to support complex recognition techniques used by, for example, biometric fusion devices, resulting in improved accuracy and robustness in both biometric authentication and biometric recognition.


Find Patent Forward Citations

Loading…