The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2014
Filed:
Dec. 30, 2011
Applicant:
Hiroaki Okamoto, Yokohama, JP;
Inventor:
Hiroaki Okamoto, Yokohama, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G01B 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
There is provided an exposure condition determining method for determining an exposure condition for an exposure-objective substrate having a plurality of semiconductor pattern features formed by predetermined exposure on a surface thereon, the method including, irradiating an illumination light onto a surface of a substrate, which has the pattern features, detecting a diffracted light from the plurality of semiconductor pattern features of the substrate irradiated with the illumination light, and determining the exposure condition based on a variation in brightness of the detected diffracted light.