The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 04, 2014

Filed:

Apr. 06, 2011
Applicants:

Brian P. Deeth, Midland, MI (US);

John Joseph Kennan, Midland, MI (US);

Kevin Dale Lewis, Sanford, MI (US);

Inventors:

Brian P. Deeth, Midland, MI (US);

John Joseph Kennan, Midland, MI (US);

Kevin Dale Lewis, Sanford, MI (US);

Assignee:

Dow Corning Corporation, Midland, MI (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08G 77/04 (2006.01); C08G 77/42 (2006.01); C08F 283/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

Silicone-polyether block copolymers are disclosed, having the average formula: RRSi(ORSi){[RO(CHO)RRSi(ORSi)]RO(CHO)RRSi)}OSiRRwherein Ris C-Chydrocarbyl; Ris C-Chydrocarbylene; Ris Ror H; Ris —R—NRor —R—NR—R—NR; Ris Ror R; h is 1 to 100; k is 2 to 500; m is 2 to 500; n is 0 to 30; p is 2 to 120; and q is 2 to 4. The silicone-polyether block copolymers comprise two terminal amine functionalities and may comprise varying degrees of pendent amine functionality. In a method for synthesizing linear silicone-polyether block copolymers of the above formula, a reaction mixture is formed by combining a polyether, an organosilicon component, an endblocking agent, and a catalyst. Thereupon, the reaction mixture is heated to produce a silicone-polyether block copolymer having at least one pendent amine functionality and a number-average molecular weight from 2000 to 500,000. Also disclosed are silicone-polyether block copolymers prepared according to the above method.


Find Patent Forward Citations

Loading…