The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2014
Filed:
Jun. 19, 2012
Kuniyoshi Kobayashi, Oizumi-machi, JP;
Hiroki Busujima, Ota, JP;
Yasuhiro Kikuchi, Ota, JP;
Yuichi Tamaoki, Oizumi-machi, JP;
Shinji Sugimoto, Ota, JP;
Tetsuo Sakurai, Ota, JP;
Kuniyoshi Kobayashi, Oizumi-machi, JP;
Hiroki Busujima, Ota, JP;
Yasuhiro Kikuchi, Ota, JP;
Yuichi Tamaoki, Oizumi-machi, JP;
Shinji Sugimoto, Ota, JP;
Tetsuo Sakurai, Ota, JP;
Panasonic Healthcare Co., Ltd., Ehime, JP;
Abstract
A culture apparatus comprising: an inner box configured to form a culture chamber; an outer box configured to cover the inner box; a fan configured to circulate gas inside the culture chamber through an air passage provided in the inner box within the culture chamber; a first through hole configured to penetrate a wall configuring a part of the air passage in the inner box; a second through hole configured to penetrate the wall and disposed at a position at which a flow velocity of the gas circulated through the air passage by the fan is lower than a flow velocity of the gas around the first through hole; a connecting pipe configured to connect the first through hole and the second through hole outside of the inner box; and a sensor configured to detect a concentration of the gas flowing in the culture chamber.