The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2014
Filed:
Mar. 09, 2009
Bing Liu, Ann Arbor, MI (US);
Zhendong HU, Ann Arbor, MI (US);
Makoto Murakami, Ann Arbor, MI (US);
Jingzhou Xu, Ann Arbor, MI (US);
Yong Che, Ann Arbor, MI (US);
Bing Liu, Ann Arbor, MI (US);
Zhendong Hu, Ann Arbor, MI (US);
Makoto Murakami, Ann Arbor, MI (US);
Jingzhou Xu, Ann Arbor, MI (US);
Yong Che, Ann Arbor, MI (US);
IMRA America, Inc., Ann Arbor, MI (US);
Abstract
A method of forming patterns on transparent substrates using a pulsed laser is disclosed. Various embodiments include an ultrashort pulsed laser, a substrate that is transparent to the laser wavelength, and a target plate. The laser beam is guided through the transparent substrate and focused on the target surface. The target material is ablated by the laser and is deposited on the opposite substrate surface. A pattern, for example a gray scale image, is formed by scanning the laser beam relative to the target. Variations of the laser beam scan speed and scan line density control the material deposition and change the optical properties of the deposited patterns, creating a visual effect of gray scale. In some embodiments patterns may be formed on a portion of a microelectronic device during a fabrication process. In some embodiments high repetition rate picoseconds and nanosecond sources are configured to produce the patterns.