The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2014
Filed:
May. 12, 2011
Koji Yano, Kawasaki, JP;
Otto Albrecht, Atsugi, JP;
Kunihiro Mitsutake, Yokohama, JP;
Takeyuki Sone, Kashiwa, JP;
Koji Yano, Kawasaki, JP;
Otto Albrecht, Atsugi, JP;
Kunihiro Mitsutake, Yokohama, JP;
Takeyuki Sone, Kashiwa, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
Provided is a film-forming method based on an LB method by which a uniform alignment film using a helical polyacetylene can be obtained. The method based on the LB method includes: developing a helical polyacetylene onto a liquid surface; and transferring a monolayer film of the helical polyacetylene formed on the liquid surface onto a substrate to form a film, in which a compressibility P represented by the following formula (1) at a time of the film formation is 1×10m/mN or less: P=(1/(dH/dS))×(1/S) (1), where H represents a surface pressure (mN/m) of the monolayer film of the helical polyacetylene, and S represents an area (m) of the monolayer film of the helical polyacetylene developed onto the liquid surface.