The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 04, 2014

Filed:

Jan. 07, 2010
Applicants:

Jae Sun Jung, Daejeon, KR;

Su Hyong Yun, Chuncheonsi, KR;

Minchan Kim, Daegu, KR;

Sung Won Han, Seoul, KR;

Yong Joo Park, Gongju-si, KR;

Su Jung Shin, Incheon, KR;

Ki Whan Sung, Jeonllabuk-do, KR;

Sang Kyung Lee, Yongin-si, KR;

Inventors:

Jae Sun Jung, Daejeon, KR;

Su Hyong Yun, Chuncheonsi, KR;

Minchan Kim, Daegu, KR;

Sung Won Han, Seoul, KR;

Yong Joo Park, Gongju-si, KR;

Su Jung Shin, Incheon, KR;

Ki Whan Sung, Jeonllabuk-do, KR;

Sang Kyung Lee, Yongin-si, KR;

Assignee:

Soulbrain Sigma-Aldrich Ltd., Chungcheongnam-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/18 (2006.01); C07F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided is a germanium complex represented by Chemical Formula 1 wherein Y1 and Y2 are independently selected from R3, NR4R5 or OR6, and R1 through R6 independently represent (Ci-C7) alkyl. The provided germanium complex with an amidine derivative ligand is thermally stable, is highly volatile, and does not include halogen components. Therefore, it may be usefully used as a precursor to produce high-quality germanium thin film or germanium-containing compound thin film by metal organic chemical vapor deposition (MOCVD) or atomic layer deposition (ALD).


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