The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2014
Filed:
Jan. 21, 2010
Xiquan Cui, Pasadena, CA (US);
Changhuei Yang, Pasadena, CA (US);
Xiquan Cui, Pasadena, CA (US);
Changhuei Yang, Pasadena, CA (US);
California Institute of Technology, Pasadena, CA (US);
Abstract
Embodiments of the present invention relate to a method for computing depth sectioning of an object using a quantitative differential interference contrast device having a wavefront sensor with one or more structured apertures, a light detector and a transparent layer between the structured apertures and the light detector. The method comprises receiving light, by the light detector, through the one or more structured apertures. The method also measures the amplitude of an image wavefront, and measures the phase gradient in two orthogonal directions of the image wavefront based on the light. The method can then reconstruct the image wavefront using the amplitude and phase gradient. The method can then propagate the reconstructed wavefront to a first plane intersecting an object at a first depth. In one embodiment, the method propagates the reconstructed wavefront to additional planes and generates a three-dimensional image based on the propagated wavefronts.