The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2014

Filed:

Mar. 18, 2010
Applicants:

Takahiro Fujiwara, Tokyo, JP;

Hideki Nara, Tokyo, JP;

Inventors:

Takahiro Fujiwara, Tokyo, JP;

Hideki Nara, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a method for inexpensively producing di-μ-chloro-bis[chloro(η-1-isopropyl-4-methylbenzene)ruthenium (II)] complex used as a catalyst raw material for a hydrogenation or metathesis polymerization reaction at a high yield. In the present invention, the above-described problem can be solved by reacting ruthenium chloride or a hydrate thereof with γ-terpinene in a solvent. In particular, by using an alcohol having a boiling point of 100° C. or higher as a solvent, the yield of the above-described complex can be increased.


Find Patent Forward Citations

Fujiwara, Takahiro. (2014). Method for producing ruthenium complex (U.S. Patent No. 8658815). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8658815

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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