The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2014
Filed:
Oct. 25, 2010
Wei Chen, Shanghai, CN;
Eric Scott Moyer, Midland, MI (US);
Binh Thanh Nguyen, Midland, MI (US);
Sheng Wang, Midland, MI (US);
Mark A. Wanous, Midland, MI (US);
Xiaobing Zhou, Midland, MI (US);
Wei Chen, Shanghai, CN;
Eric Scott Moyer, Midland, MI (US);
Binh Thanh Nguyen, Midland, MI (US);
Sheng Wang, Midland, MI (US);
Mark A. Wanous, Midland, MI (US);
Xiaobing Zhou, Midland, MI (US);
Dow Corning Corporation, Midland, MI (US);
Abstract
A polysilane-polysilazane copolymer contains a polysilane unit of formula (I), and a polysilazane unit of formula (II), where each Rand each Rare each independently selected from H, Si, and N atoms, Ris selected from H, Si, or C atoms, a≧1, b≧1, and a quantity (a+b)≧2. The polysilane-polysilazane copolymer may be formulated in a composition with a solvent. The polysilane-polysilazane copolymer may be used in PMD and STI applications for trench filling, where the trenches have widths of 100 nm or less and aspect ratios of at least (6). The polysilane-polysilazane copolymer can be prepared by amination of a perchloro polysilane having (2) or more silicon atoms per molecule with a primary amine.