The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2014
Filed:
Nov. 01, 2010
Goutam Biswas, Danville, CA (US);
Darush Farshid, Larkspur, CA (US);
Lucy Wu, Albany, CA (US);
James Knight, Gautier, MS (US);
David Bosi, Napa, CA (US);
Michael K. Porter, Cypress, TX (US);
Goutam Biswas, Danville, CA (US);
Darush Farshid, Larkspur, CA (US);
Lucy Wu, Albany, CA (US);
James Knight, Gautier, MS (US);
David Bosi, Napa, CA (US);
Michael K. Porter, Cypress, TX (US);
Chevron U.S.A. Inc., San Ramon, CA (US);
Abstract
The present disclosure provides a system and method for responding to an unintended increase in pressure within a high pressure processing system. The system and method of the present disclosure provides a pressure relief system that releases pressure reliably even if the material under pressure is of mixed phase. In addition, the system and method for releasing pressure avoids the need for complex subsystems to contain and process materials that escape the system during the pressure release process.