The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2014
Filed:
Nov. 04, 2010
Deuk-seok Chung, Yongin-si, KR;
Yong-wan Jin, Seoul, KR;
Deuk-seok Chung, Yongin-si, KR;
Yong-wan Jin, Seoul, KR;
Abstract
A method of manufacturing an active matrix electrochromic device includes preparing a first substrate including a thin film transistor including a gate electrode, a source electrode, and a drain electrode, and a pixel electrode electrically connected to the drain electrode. An electrochromic layer is formed on the pixel electrode by an electrophoretic process which includes immersing the first substrate and a mesh spaced apart from each other in a solution. While the first substrate is immersed in the solution so that the pixel electrode is soaked therein, a channel of the thin film transistor is opened by applying a voltage to the gate electrode, a potential difference between the pixel electrode and the mesh is generated by connecting a voltage source between a terminal electrically connected to the source electrode and the mesh, and materials in the solution are deposited on the pixel electrode, thereby forming the electrochromic semiconductor layer.