The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2014
Filed:
Apr. 21, 2009
Jérôme Primot, Chatillon, FR;
Bruno Toulon, Saligny, FR;
Nicolas Guérineau, Antony, FR;
Sabrina Velghe, Villebon-sur-Yvette, FR;
Riad Haidar, Paris, FR;
Jérôme Primot, Chatillon, FR;
Bruno Toulon, Saligny, FR;
Nicolas Guérineau, Antony, FR;
Sabrina Velghe, Villebon-sur-Yvette, FR;
Riad Haidar, Paris, FR;
Office National d'Etudes et de Recherches Aerospatiales (Onera), Chatillon, FR;
Abstract
The application relates to a method for analyzing the wave surface of a light beam from a source to the focus of a lens. The beam illuminates a sample on the analysis plane and having a defect. A diffraction grating of the plane is a conjugate of an analysis plane through a focal system. An image is formed in a plane at a distance from the grating plane and analyzed by processing means. The invention encodes this grating by a phase function resulting from the multiplication of two phase functions, a first exclusion function defining a meshing of useful zones transmitting the beam to be analyzed in the form of light pencil beams, and a second phase fundamental function which creates a phase opposition between two light pencil beams coming out of adjacent meshes of the exclusion grating.