The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2014
Filed:
Mar. 30, 2011
Applicant:
Koichi Terao, Suwa, JP;
Inventor:
Koichi Terao, Suwa, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1343 (2006.01);
U.S. Cl.
CPC ...
Abstract
An oblique vapor deposition substrate having an oblique vapor deposition layer formed thereon is provided, wherein a plurality of pixel sections is arranged in a matrix of intersected straight lines of two directions with each pixel section being spaced apart from each other, and has been relatively rotated in a plane of the oblique vapor deposition substrate taking into consideration the distribution of the vapor deposition directions in the oblique vapor deposition layer.