The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2014
Filed:
Feb. 02, 2011
Applicant:
Hiroaki Jiroku, Suwa, JP;
Inventor:
Hiroaki Jiroku, Suwa, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/1333 (2006.01); G02F 1/136 (2006.01);
U.S. Cl.
CPC ...
Abstract
A liquid-crystal apparatus has an element substrate. This element substrate contains depressions inside, and these depressions are sealed with an insulating film, a silicon dioxide coating. To this end, the insulating film is formed by chemical vapor deposition, and this coating process lasts until voids formed in the depressions are closed at the top by the insulating film. Then, the insulating coating is ground. This grinding process lasts until the insulating film is flat, but should be terminated before the voids are opened.