The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2014
Filed:
Nov. 13, 2006
Thomas Kirchmeier, Teningen, DE;
Michael Glück, Freiburg, DE;
Christoph Hofstetter, Teningen, DE;
Gerd Hintz, Pfaffenweiler, DE;
Thomas Kirchmeier, Teningen, DE;
Michael Glück, Freiburg, DE;
Christoph Hofstetter, Teningen, DE;
Gerd Hintz, Pfaffenweiler, DE;
HUETTINGER Elektronik GmbH + Co. KG, Freiburg, DE;
Abstract
In one aspect, operating a vacuum plasma process system including a plasma discharge chamber is accomplished by generating a main plasma in the discharge chamber in a first operating state, and generating an auxiliary plasma in the discharge chamber in a second operating state. Generating the main plasma includes generating a main plasma power with a first number of RF power generators, and generating an auxiliary plasma power with a second number of RF power generators, such that the second number is smaller than the first number.