The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2014
Filed:
Mar. 09, 2012
Kenji Suzuki, Chichibu, JP;
Kenji Suzuki, Chichibu, JP;
Showa Denko K.K., Tokyo, JP;
Abstract
One object of the present invention is to provide a method for producing a thick film metal electrode that is able to form a positive-negative reverse type resist, which has a thickness of 7 μm or more and excellent in-plane uniformity, on the circuit element formed on the silicon carbide substrate, and a method for producing a thick film resist, and the present invention provides a method for producing a thick film resist wherein a first positive-negative reverse type resist having a first viscosity is formed on an upper surface of a circuit element layer which is treated with HMDS, and a second positive-negative reverse type resist having a second viscosity, which is larger than the first viscosity, on the first positive-negative reverse type resist such that a total thickness of the first and second positive-negative reverse type resists constituting a thick film resist be 7 μm or more.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile