The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2014

Filed:

Jan. 26, 2012
Applicants:

Makoto Watanabe, Yokohama, JP;

Yoshinori Tagawa, Yokohama, JP;

Hiroyuki Murayama, Kawasaki, JP;

Mitsuru Chida, Yokohama, JP;

Masataka Nagai, Yokohama, JP;

Inventors:

Makoto Watanabe, Yokohama, JP;

Yoshinori Tagawa, Yokohama, JP;

Hiroyuki Murayama, Kawasaki, JP;

Mitsuru Chida, Yokohama, JP;

Masataka Nagai, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
Abstract

Provided is a process for producing a liquid ejection head including an ejection orifice member having a plurality of ejection orifices for ejecting liquid provided along an arrangement direction, the process including preparing a substrate provided with a resin layer which contains a photocurable resin; carrying out a first exposure treatment and a second exposure treatment which are each of an exposure treatment of subjecting the resin layer to exposure; and forming the ejection orifices of the resin layer subjected to the first exposure treatment and the second exposure treatment. An inclination angle of a side wall of the ejection orifices formed by the first exposure treatment with respect to the substrate differs from an inclination angle of a side wall of the ejection orifices formed by the second exposure treatment with respect to the substrate.


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