The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2014
Filed:
Apr. 30, 2009
Thomas Gessner, Chemnitz, DE;
Andreas Bertz, Chemnitz, DE;
Reinhard Schubert, Chemnitz, DE;
Thomas Werner, Oederan, DE;
Wolfgang Hentsch, Radebeul, DE;
Reinhard Fendler, Moritzburg, DE;
Lutz Koehler, Radebeul, DE;
Thomas Gessner, Chemnitz, DE;
Andreas Bertz, Chemnitz, DE;
Reinhard Schubert, Chemnitz, DE;
Thomas Werner, Oederan, DE;
Wolfgang Hentsch, Radebeul, DE;
Reinhard Fendler, Moritzburg, DE;
Lutz Koehler, Radebeul, DE;
FHR Anlagenbau GmbH, Ottendorf-Okrilla, DE;
Abstract
A method and an apparatus for forming a structure on a component made of a material composed of silicon oxide, especially of silicate glass, glass ceramic or quartz, wherein in accordance with the process at least a first surface of the component a partial removal of the material by plasma etching takes place and during the plasma etching at least at the surface to be etched a substrate temperature is established which is substantially greater than 90° C. but less than the softening temperature of the material. The apparatus is equipped for this purpose with a heater for generating the substrate temperature.