The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2014
Filed:
Nov. 26, 2008
Jinqiu Zhang, Fremont, CA (US);
Hai Sun, Milpitas, CA (US);
Hongping Yuan, Fremont, CA (US);
Tsung Yuan Chen, San Jose, CA (US);
Jinqiu Zhang, Fremont, CA (US);
Hai Sun, Milpitas, CA (US);
Hongping Yuan, Fremont, CA (US);
Tsung Yuan Chen, San Jose, CA (US);
Western Digital (Fremont), LLC, Fremont, CA (US);
Abstract
A method for providing a perpendicular magnetic recording (PMR) head is disclosed. The method comprises: providing an insulating layer; covering the insulating layer with a hard mask material; forming a pre-defined shape in the hard mask material; forming a pole trench and a yoke area in the insulating layer by a first reactive ion etching (RIE) process in which the yoke area includes a loading prevention pattern; performing a wet etching process to remove the hard mask material from the pole trench and the yoke area; performing a second RIE process to remove the loading prevention pattern of the yoke area, wherein the pole trench and the remainder of the yoke area are not removed and remain having similar side wall angles; and providing a PMR pole in which at least a portion of the PMR pole resides in the pole trench.