The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2014
Filed:
Nov. 28, 2011
Ruopeng Liu, Guangdong, CN;
Guanxiong Xu, Guangdong, CN;
Yangyang Zhang, Guangdong, CN;
Kuang-Chi Innovative Technology Ltd., FuTian District, Shenzhen, Guangdong, CN;
Kuang-Chi Institute of Advanced Technology, High-Tech Industrial Estate, Nanshan District, Shenzhen, Guangdong, CN;
Abstract
A metamaterial for separating an electromagnetic wave beam is disclosed. Two kinds of man-made microstructures are attached on a substrate of the metamaterial. The first man-made microstructures each have a principal optical axis parallel to a first electric field direction, and the second man-made microstructures each have a principal optical axis parallel to a second electric field direction. The metamaterial comprises a first region and a second region. The first man-made microstructures in the first region have the largest geometric size and the first man-made microstructures in other regions increase in geometric size continuously in a direction towards the first region; and the second man-made microstructures in the second region have the largest geometric size and the second man-made microstructures in other regions increase in geometric size continuously in a direction towards the second region.