The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2014
Filed:
Sep. 30, 2010
Franz X. Kartner, Newton, MA (US);
Gilberto Abram, Brooklyn, NY (US);
William P. Putnam, Cambridge, MA (US);
Shu-wei Huang, Cambridge, MA (US);
Edilson L. Falcao-filho, Recife, BR;
Franz X. Kartner, Newton, MA (US);
Gilberto Abram, Brooklyn, NY (US);
William P. Putnam, Cambridge, MA (US);
Shu-Wei Huang, Cambridge, MA (US);
Edilson L. Falcao-Filho, Recife, BR;
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
An enhancement cavity includes a plurality of focusing mirrors, at least one of which defines a central aperture having a diameter greater than 1 mm. The mirrors are configured to form an optical pathway for closed reflection and transmission of the optical pulse within the enhancement cavity. Ring-shaped optical pulses having a peak intensity at a radius greater than 0.5 mm from a central axis are directed into the enhancement cavity. Accordingly, the peak intensity of the optical pulse is distributed so as to circumscribe the central apertures in the apertured mirrors, and the mirrors are structured to focus the pulse about the aperture toward a central spot area where the pulse is focused to a high intensity.