The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2014
Filed:
Dec. 02, 2010
Andrew Macmillan, Lombard, IL (US);
Eric Scott Moyer, Midland, MI (US);
Michael Robert Reiter, Midland, MI (US);
Kasumi Takeuchi, Midland, MI (US);
Sheng Wang, Midland, MI (US);
Craig Rollin Yeakle, Midland, MI (US);
Andrew MacMillan, Lombard, IL (US);
Eric Scott Moyer, Midland, MI (US);
Michael Robert Reiter, Midland, MI (US);
Kasumi Takeuchi, Midland, MI (US);
Sheng Wang, Midland, MI (US);
Craig Rollin Yeakle, Midland, MI (US);
Dow Corning Corporation, Midland, MI (US);
Abstract
Disclosed is silsesquioxane resin composition that contains a free radical curable functional group that is stabilized with a hydrophilic inhibitor. The hydrophilic inhibitor that has the capability to scavenge free radicals such as ascorbic acid or salicylic acid is used to stabilize the resin. The resins are useful in semiconductor formation such as for anti-reflective coatings, hardmasks or photoresist layers.