The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 2014

Filed:

Oct. 24, 2011
Applicants:

Yeau-ren Jeng, Tainan, TW;

Chung-ming Tan, Chiayi, TW;

Inventors:

Yeau-Ren Jeng, Tainan, TW;

Chung-Ming Tan, Chiayi, TW;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 33/38 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention discloses a method for enhancing hardness of a nanoimprint mold comprising following steps of: providing a male mold, composed of a first material, for imprinting a female mold and producing a nano structural pattern on the female mold, and the female mold composed of a second material, wherein the hardness of the first material is higher than the hardness of the second material; applying a nano-indentation technique to the female mold onto the female mold by a nano-indentation apparatus having a diamond array probe so as to enhance the surface hardness of the female mold; and impressing a substrate by the female mold with the nano structural pattern having the enhanced surface.


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