The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2014
Filed:
Mar. 08, 2012
Tomonori Takahashi, Mesa, AZ (US);
Tadashi Inaba, Yoshida-Cho, JP;
Atsushi Mizutani, Yoshida-Cho, JP;
Bing Du, Gilbert, AZ (US);
William A. Wojtczak, Austin, TX (US);
Kazutaka Takahashi, Yaizu, JP;
Tetsuya Kamimura, Fujieda, JP;
Tomonori Takahashi, Mesa, AZ (US);
Tadashi Inaba, Yoshida-Cho, JP;
Atsushi Mizutani, Yoshida-Cho, JP;
Bing Du, Gilbert, AZ (US);
William A. Wojtczak, Austin, TX (US);
Kazutaka Takahashi, Yaizu, JP;
Tetsuya Kamimura, Fujieda, JP;
Fujifilm Electronic Materials U.S.A., Inc., North Kingstown, RI (US);
Fujifilm Corporation, Tokyo, JP;
Abstract
This disclosure relates to an etching composition containing at least one sulfonic acid, at least one compound containing a halide anion, the halide being chloride or bromide, at least one compound containing a nitrate or nitrosyl ion, and water. The at least one sulfonic acid can be from about 25% by weight to about 95% by weight of the composition. The halide anion can be chloride or bromide, and can be from about 0.01% by weight to about 0.5% by weight of the composition. The nitrate or nitrosyl ion can be from about 0.1% by weight to about 20% by weight of the composition. The water can be at least about 3% by weight of the composition.