The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 2014

Filed:

Nov. 12, 2006
Applicants:

Alan Alexander Ritchie, Pleasanton, CA (US);

Donny Young, San Jose, CA (US);

Ilyoung (Richard) Hong, San Jose, CA (US);

Kathleen A. Scheible, San Francisco, CA (US);

Umesh Kelkar, Santa Clara, CA (US);

Inventors:

Alan Alexander Ritchie, Pleasanton, CA (US);

Donny Young, San Jose, CA (US);

Ilyoung (Richard) Hong, San Jose, CA (US);

Kathleen A. Scheible, San Francisco, CA (US);

Umesh Kelkar, Santa Clara, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
Abstract

A sputtering chamber has a sputtering target comprising a backing plate and a sputtering plate. The backing plate has a groove. The sputtering plate comprises a cylindrical mesa having a plane, and an annular inclined rim surrounding the cylindrical mesa. In one version, the backing plate comprises a material having a high thermal conductivity and a low electrical resistivity. In another version, the backing plate comprises a backside surface with a single groove or a plurality of grooves.


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