The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2014
Filed:
Feb. 15, 2013
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Kyoung-Hoon Min, Daejeon, KR;
Ye-Hoon Im, Daejeon, KR;
Dae-Yeon Lee, Chungbuk, KR;
Jae-Ik Song, Gyeonggi-do, KR;
Su-Chan Park, Daejeon, KR;
Assignee:
LG Chem, Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A polishing pad of a polishing system is mountable to a polishing plate and has a predetermined channel pattern so as to allow a polishing liquid supplied from a polishing liquid supplier to move on a polishing surface. The channel pattern has at least two kinds of patterns.