The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2014
Filed:
Nov. 20, 2009
Chun-yih Wu, Taichung, TW;
Hung-hsuan Lin, Taipei, TW;
Ken-huang Lin, Kaohsiung, TW;
Hsin-lung Su, Kaohsiung, TW;
Chih-chun Hsu, Taipei, TW;
Chun-Yih Wu, Taichung, TW;
Hung-Hsuan Lin, Taipei, TW;
Ken-Huang Lin, Kaohsiung, TW;
Hsin-Lung Su, Kaohsiung, TW;
Chih-Chun Hsu, Taipei, TW;
Industrial Technology Research Institute, Hsinchu, TW;
National Sun Yat-sen University, Kaohsiung, TW;
Abstract
A radiation pattern insulator and an antennae system thereof are proposed. The radiation pattern insulator includes a dielectric substrate and a plurality of radiation pattern insulation elements. The dielectric substrate allocated between a plurality of antennae includes a top surface and a bottom surface, and a normal direction of the dielectric substrate is substantially perpendicular to propagation directions of electromagnetic waves radiated from the antennae. In addition, the radiation pattern insulation elements are allocated on the top surface or the bottom surface of the dielectric substrate, or alternatively, all allocated on the top surface and the bottom surface.