The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2014
Filed:
Nov. 23, 2010
Min-seok OH, Yongin-si, KR;
Bong-kyu Shin, Bucheon-si, KR;
Sang-gab Kim, Seoul, KR;
Eun-guk Lee, Yongin-si, KR;
Hong-kee Chin, Suwon-si, KR;
Yu-gwang Jeong, Yongin-si, KR;
Seung-ha Choi, Shiheung-si, KR;
Min-Seok Oh, Yongin-si, KR;
Bong-Kyu Shin, Bucheon-si, KR;
Sang-Gab Kim, Seoul, KR;
Eun-Guk Lee, Yongin-si, KR;
Hong-Kee Chin, Suwon-si, KR;
Yu-Gwang Jeong, Yongin-si, KR;
Seung-Ha Choi, Shiheung-si, KR;
Samsung Display Co., Ltd., , KR;
Abstract
A method of forming a display substrate includes forming an array layer on a substrate, forming a passivation layer on the array layer, forming a photoresist pattern on the passivation layer corresponding to a gate line, a source line and a thin-film transistor of the array layer, etching the passivation layer using the photoresist pattern as a mask, Non-uniformly surface treating a surface of the photoresist pattern, forming a transparent electrode layer on the substrate having the surface-treated photoresist pattern formed thereon and forming a pixel electrode. The forming a pixel electrode includes removing the photoresist pattern and the transparent electrode layer, such as by infiltrating a strip solution into the surface-treated photoresist pattern.