The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2014

Filed:

Sep. 23, 2008
Applicants:

Helge A. Reisch, Rensselaer, NY (US);

Peter Leeming, Schenectady, NY (US);

Prasad S. Raje, Mumbai, IN;

Inventors:

Helge A. Reisch, Rensselaer, NY (US);

Peter Leeming, Schenectady, NY (US);

Prasad S. Raje, Mumbai, IN;

Assignee:

Topotarget UK Ltd., Oxford, GB;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C 303/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention pertains to the general field of chemical synthesis, and more particularly to methods for the synthesis of certain hydroxamic acid compounds, and in particular, (E)-N-hydroxy-3-(3-phenylsulfamoyl-phenyl)-acrylamide, also known as PXD101 and Belinostat®, comprising, for example, the steps of: (SAF) sulfonamide formation; (PUR) optional purification; (AAA) alkenyl-acid addition, comprising: either (i): the steps of, in order: (ACAEA) alkenyl-carboxylic acid ester addition; (PUR) optional purification; and (CAD) carboxylic acid deprotection; or (ii): the step of: (ACAA) alkenyl-carboxylic acid addition; (PUR) optional purification; (HAF) hydroxamic acid formation; and (PUR) optional purification.


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