The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2014

Filed:

Nov. 18, 2010
Applicants:

Koki Yano, Chiba, JP;

Masayuki Itose, Chiba, JP;

Mami Nishimura, Chiba, JP;

Inventors:

Koki Yano, Chiba, JP;

Masayuki Itose, Chiba, JP;

Mami Nishimura, Chiba, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01B 1/02 (2006.01); H01B 1/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A sputtering target including oxide A shown below and indium oxide (InO) having a bixbyite crystal structure: Oxide A: an oxide which includes an indium element (In), a gallium element (Ga) and a zinc element (Zn) in which diffraction peaks are observed at positions corresponding to incident angles (2θ) of 7.0° to 8.4°, 30.6° to 32.0°, 33.8° to 35.8°, 53.5° to 56.5° and 56.5° to 59.5° in an X-ray diffraction measurement (CuKα rays).


Find Patent Forward Citations

Yano, Koki. (2014). In—ga—zn type oxide sputtering target (U.S. Patent No. 8641930). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8641930

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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