The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2014
Filed:
Jul. 20, 2012
Sunghoon Kwon, Seoul, KR;
Seungah Lee, Gyeonggi-do, KR;
Wook Park, Seoul, KR;
Su Eun Chung, Seoul, KR;
Sunghoon Kwon, Seoul, KR;
SeungAh Lee, Gyeonggi-do, KR;
Wook Park, Seoul, KR;
Su Eun Chung, Seoul, KR;
SNU R&DB Foundation, Seoul, KR;
Abstract
An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.