The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2014
Filed:
Oct. 01, 2012
Canon Kabushiki Kaisha, Tokyo, JP;
Masafumi Kyogaku, Yokohama, JP;
Koichi Tanji, Kawasaki, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
To provide a method that reduces an influence of dependence of an ionizing beam in an incident direction or uneven irradiation to a sample on a result of mass spectrometry, and can measure mass distribution with high reliability. A mass distribution measuring method according to the present invention includes: changing a direction of irradiating the ionizing beam to a sample surface; acquiring a plurality of mass distribution images in a plurality of incident directions; performing image transform of the mass distribution images according to an angle formed by an incident direction of the ionizing beam and a substrate surface; synthesizing the plurality of transformed images; and outputting the synthesized mass distribution images.