The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 28, 2014

Filed:

Aug. 31, 2012
Applicants:

Hong-sick Park, Suwon-si, KR;

Bong-kyun Kim, Hwaseong-si, KR;

Wang-woo Lee, Suwon-si, KR;

Ki-beom Lee, Seoul, KR;

Sam-young Cho, Anyang-si, KR;

Won-guk Seo, Suwon-si, KR;

Gyu-po Kim, Hwaseong-si, KR;

Inventors:

Hong-Sick Park, Suwon-si, KR;

Bong-Kyun Kim, Hwaseong-si, KR;

Wang-Woo Lee, Suwon-si, KR;

Ki-Beom Lee, Seoul, KR;

Sam-Young Cho, Anyang-si, KR;

Won-Guk Seo, Suwon-si, KR;

Gyu-Po Kim, Hwaseong-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
Abstract

An etching composition for a copper-containing layer includes about 0.1% to about 30% by weight of ammonium persulfate, about 0.1% to about 10% by weight of a sulfate, about 0.01% to about 5% by weight of an acetate and about 55% to about 99.79% by weight of water. The etching composition having improved stability during storage and an increased capacity for etching.


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