The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2014
Filed:
Oct. 20, 2005
Applicants:
Fengxiang Zhang, Singapore, SG;
Hong Yee Low, Singapore, SG;
Inventors:
Fengxiang Zhang, Singapore, SG;
Hong Yee Low, Singapore, SG;
Assignee:
Agency for Science, Technology and Research, Centros, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 59/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for forming hierarchical patterns on an article by nanoimprinting is disclosed. The method includes using a first mold to form a primary pattern on the article at a first temperature and a first pressure, the first temperature and the first pressure being able to reduce the elastic modulus of the article; and using a second mold to form a second pattern on the primary pattern at a second temperature that is below the article's glass transition temperature, the forming of the second pattern being at a second pressure.