The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2014

Filed:

Dec. 21, 2010
Applicants:

Wen-chien D. Hsiao, San Jose, CA (US);

Aron Pentek, San Jose, CA (US);

Thomas J. A. Roucoux, San Jose, CA (US);

Inventors:

Wen-Chien D. Hsiao, San Jose, CA (US);

Aron Pentek, San Jose, CA (US);

Thomas J. A. Roucoux, San Jose, CA (US);

Assignee:

HGST Netherlands, B.V., Amsterdam, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 5/23 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method according to one embodiment includes etching an underlayer positioned under a main pole for reducing a thickness thereof and creating an undercut under the main pole; adding a gap material along sides of the main pole and in the undercut; and forming a shield along at least a portion of the gap material. A magnetic head according to one embodiment includes a main pole; an underlayer positioned under the main pole and spaced therefrom, thereby defining an undercut therebetween; a first layer of gap material extending along sides of the main pole and in the undercut; a second layer of gap material extending continuously along the underlayer under the main pole; and a shield encircling the main pole, wherein the shield extends between the first and second layers of gap material in the undercut. Additional systems and methods are also presented.


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