The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2014

Filed:

Oct. 01, 2009
Applicants:

Xin-hua HU, Greenville, NC (US);

Cheng Chen, Greenville, NC (US);

Inventors:

Xin-Hua Hu, Greenville, NC (US);

Cheng Chen, Greenville, NC (US);

Assignee:

East Carolina University, Greenville, NC (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/55 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods and systems for optically characterizing a turbid sample are provided. A structured light beam is impinged on the sample. The sample includes an embedded region. A reflected light image of the structured light beam is detected from the sample. A measured reflectance image of the structured light beam for the sample is determined based on the reflected light image and a reflectance standard. The following parameters are determined: absorption coefficients ÿa, scattering coefficient ÿs and anisotropy factor g of the sample from the reflectance image. A size parameter of the embedded region is estimated based on the absorption coefficients ÿa, scattering coefficient ÿs and/or anisotropy factor g of the sample from the measured reflectance image.


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