The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2014

Filed:

Dec. 26, 2007
Applicants:

Dong-yung Kim, Gyeongsangbuk-Do, KR;

Byoung-ho Lim, Gyeongsangbuk-Do, KR;

Inventors:

Dong-Yung Kim, Gyeongsangbuk-Do, KR;

Byoung-Ho Lim, Gyeongsangbuk-Do, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/136 (2006.01); G09G 3/36 (2006.01); H01L 29/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A trans-reflective LCD and a manufacturing method thereof are provided to simplify a manufacturing process and improve yield by reducing the number of masks and implement high definition by preventing wavy noise. A first substrate divided into a pixel unit and first and second pad units is provided. Through a first mask process, a gate electrode and a gate line are formed in the pixel unit of the first substrate. Through a second mask process, an active pattern of an island type is formed on the gate electrode in a state when a first insulating layer is interposed. On the active pattern, an n+ amorphous silicon thin film pattern and a conductive layer pattern are formed. Through a third mask process, a source electrode and a drain electrode are formed in the pixel unit of the first substrate. A data line crosses the gate line to define a pixel area comprising a reflection unit and a transmission unit. Through the third mask process, a pixel electrode comprising a transparent conductive layer is formed in the transmission unit of the pixel area. Through a fourth mask process, a second insulating layer is formed on the first substrate. Through a fifth process, a reflection electrode comprising an opaque conductive layer is formed in the reflection unit of the pixel area. The first substrate is deposited with a second substrate.


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