The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2014

Filed:

Oct. 29, 2010
Applicants:

Yi-shan Chang, Yilan County, TW;

Juin-ming Wu, Taoyuan County, TW;

Shih-hsiung Lin, Hsinchu, TW;

Ying-cheng Chen, Hsinchu County, TW;

Sheng-hung Wang, Kaohsiung, TW;

Wen-hau Lee, Chiayi County, TW;

Chang-cheng Chen, Taoyuan County, TW;

Inventors:

Yi-Shan Chang, Yilan County, TW;

Juin-Ming Wu, Taoyuan County, TW;

Shih-Hsiung Lin, Hsinchu, TW;

Ying-Cheng Chen, Hsinchu County, TW;

Sheng-Hung Wang, Kaohsiung, TW;

Wen-Hau Lee, Chiayi County, TW;

Chang-Cheng Chen, Taoyuan County, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 3/041 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of fabricating an electronic apparatus having an active region and a peripheral region surrounding the active region is described. A first main device and a second main device are provided. An optical clear liquid adhesive (OCLA) is applied between the first main device and the second main device and within the active region. A photo-mask having a transparent region and an opaque region is provided above the second main device, and the transparent region corresponds to the peripheral region. An OCLA diffusion process is performed such that the OCLA diffuses from the active region to the peripheral region. During the OCLA diffusion process, a first irradiating process with the photo-mask is performed, such that the OCLA diffusing to the peripheral region is partially cured. After removing the photo-mask, a second irradiating process is performed, such that the OCLA is completely cured.


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