The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2014

Filed:

Apr. 19, 2011
Applicants:

Gerhard Hauck, Badenhausen, DE;

Celin Savariar-hauck, Badenhausen, DE;

Oliver R. Blum, Eddigehausen-Bovenden, DE;

Michael Nielinger, Bonn, DE;

Inventors:

Gerhard Hauck, Badenhausen, DE;

Celin Savariar-Hauck, Badenhausen, DE;

Oliver R. Blum, Eddigehausen-Bovenden, DE;

Michael Nielinger, Bonn, DE;

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41N 1/00 (2006.01); G03F 7/00 (2006.01); G03F 7/26 (2006.01); G03C 1/00 (2006.01); G03C 1/77 (2006.01);
U.S. Cl.
CPC ...
Abstract

Electrochemically grained and anodized aluminum supports are treated with a post-treatment coating solution containing a polymer derived at least in part from vinyl phosphonic acid and phosphoric acid. This post-treated support is useful as substrates in the preparation of lithographic printing plate precursors. The post-treatment substrate treatment enables wide latitude in manufacturing and compatibility with silicate-free developers to achieve negligible background staining and oxide attack.


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