The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2014

Filed:

Feb. 11, 2009
Applicants:

Yann Roussillon, Sunnyvale, CA (US);

Jeremy H. Scholz, Sunnyvale, CA (US);

Addison Shelton, Sunnyvale, CA (US);

Geoff T. Green, Belmont, CA (US);

Piyaphant Utthachoo, San Jose, CA (US);

Inventors:

Yann Roussillon, Sunnyvale, CA (US);

Jeremy H. Scholz, Sunnyvale, CA (US);

Addison Shelton, Sunnyvale, CA (US);

Geoff T. Green, Belmont, CA (US);

Piyaphant Utthachoo, San Jose, CA (US);

Assignee:

Nanosolar, Inc., San Jose, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05C 9/14 (2006.01); B05C 3/02 (2006.01); B05C 5/00 (2006.01); B05B 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber; at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.


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