The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2014

Filed:

Jun. 19, 2008
Applicants:

Sunity K. Sharma, Fremont, CA (US);

Francesco Fornasiero, Berkeley, CA (US);

Jaspreet Singh Dhau, Menlo Park, CA (US);

Inventors:

Sunity K. Sharma, Fremont, CA (US);

Francesco Fornasiero, Berkeley, CA (US);

Jaspreet Singh Dhau, Menlo Park, CA (US);

Assignee:

SRI International, Menlo Park, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05K 3/10 (2006.01); H05K 3/38 (2006.01); H05K 3/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method for forming conductive lines on a substrate comprising depositing a precursor onto at least a portion of the substrate, depositing a thin layer of conductive material over the precursor, forming a negative-patterned mask over a portion of the thin layer of conductive material to form an exposed pattern, forming conductive lines in the exposed pattern, removing the patterned mask thereby uncovering an exposed portion of the conductive layer that substantially corresponds to the negative pattern portion, and removing the exposed portion of the conductive layer so as to uncover substrate that substantially corresponds to the exposed portion.


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