The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2014

Filed:

Jun. 27, 2012
Applicants:

Weimin SI, San Ramon, CA (US);

Ying Hong, Los Gatos, CA (US);

Zhigang Bai, Milpitas, CA (US);

Yunhe Huang, Pleasanton, CA (US);

Fenglin Liu, Milpitas, CA (US);

Hong Zhang, Fremont, CA (US);

Jikou Zhou, Pleasanton, CA (US);

Xiaoyu Yang, Union City, CA (US);

Yuan Yao, Fremont, CA (US);

Iulica Zana, Fremont, CA (US);

Feng Liu, San Ramon, CA (US);

Ling Wang, Hercules, CA (US);

Inventors:

Weimin Si, San Ramon, CA (US);

Ying Hong, Los Gatos, CA (US);

Zhigang Bai, Milpitas, CA (US);

Yunhe Huang, Pleasanton, CA (US);

Fenglin Liu, Milpitas, CA (US);

Hong Zhang, Fremont, CA (US);

Jikou Zhou, Pleasanton, CA (US);

Xiaoyu Yang, Union City, CA (US);

Yuan Yao, Fremont, CA (US);

Iulica Zana, Fremont, CA (US);

Feng Liu, San Ramon, CA (US);

Ling Wang, Hercules, CA (US);

Assignee:

Western Digital (Fremont), LLC, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for fabricating a magnetic recording transducer having a magnetic writer pole with a short effective throat height is provided. In an embodiment, a writer structure comprising a magnetic writer pole having a trailing bevel and a nonmagnetic stack on the top surface of the writer pole is provided. A dielectric write gap layer comprising alumina is deposited over the trailing bevel section and the nonmagnetic stack; and at least one etch stop layer is deposited over the dielectric write gap layer. A layer of nonmagnetic fill material is deposited over the etch stop layer and to form a nonmagnetic bevel by performing a dry etch process. The etch stop layer(s) are removed from the short throat section; and a trailing shield is deposited over the short throat section, nonmagnetic bevel, and nonmagnetic stack top surface.


Find Patent Forward Citations

Loading…